The present paper describes an inductively coupled barrel type reactor assembly that allows films deposition. A r.f glow discharge at 13,56 MHz is performed in the reactor containing a mixture of organic vapour and vaporizated metal (Ag, Ni, Ge). Plasma polymer (PP) and thin films composite in 1,0 cm square and 1 mm thick glass substrates at 0,1 torr of pressure and 30 W rf discharge power was obtained. These films were qualitatively analysed by IR spectroscopy, electron microscopy (SEM), X ray diffraction and Resistance vs Temperature test by four point standard method. By means of these precedent analysis the corresponding PP phase in earlier work reported and the vaporized element phase were identified. For composite PP and Ag films, the polymer broad band and the reflections (111) and (200) of the most intense silver lines was observed. The R vs T tests showed conductive behavior for some of these films, while others keep away from this conductive behavior. These results allows supposing that the conductive behavior observed may be explained by Mott’s impurities mechanism.