Single-phase [NaCl]-structure Titanium Zirconium nitride (Ti,Zr)N thin films have been deposited using plasma assisted physical vapor deposition (PAPVD) with a target segmented (Ti70%-Zr30%). For the production of films, two faced electrodes (target and substrate of stainless steel AISI 304) were placed into the reaction chamber which was filled up with nitrogen gas until reaching the different working pressures between 3.5 mbar and 4.5 mbar with increments each 0.5 mbar. The discharges were performed using a non-commercial switched DC arc power supply which allows making variations of inter-electrode voltage (V) from 0 up to 280 volts rms (root mean square), with a maximum current of 300 amperes. The active arc time (ta) and inactive arc time (ti) values can be controlled. The working conditions were V = 230 volts, ta = 2 seconds and ti = 6 seconds in all cases. With GIXRD (Grazing Incidence X ray Diffraction) the texture coefficient, crystallite size, micro-strain and lattice parameter were evaluated. We used the Scherrer equation in order to determinate the crystallite size and micro-strain taking in account the instrumental broadening of XRD equipment. Cagliotti functions were used for determinate that constant. Rietveld refinement was employed with a pseudo voigt function. GIXRD analysis shows the formation of ternary (Ti,Zr)N nitride phase with (200) preferred orientation in all cases, lattice parameter was between 0.434 nm and 0.436 nm and the crystallite size in the (Ti,Zr)N thin films was found to be 17,90 nm and 66,19 nm at different working pressures, besides, We found that micro-strain decreases when working pressure increases. By means EDS (Energy Dispersive X-ray Spectroscopy) elemental composition of coatings was obtained. These analyses show uniform distribution of elements on the sample surface.