Zirconium nitride (ZrN) was deposited by reactive magnetron sputtering at different N2 partial pressures to exam the crystalline structure, size grain and microstress of ZrN deposited as thin film. The coating have been deposited on silicon orientation (111) substrate, when nitrogen flow increased the coating shown a δ-ZrN phase with a cubic structure type NaCl with a preferential orientation (111), also it’s observed the orientation (200), but this orientation decrease them intensity when increase the nitrogen flow meantime that first orientation (111) increase intensity. Beside produce that all peaks are moved to left this is due to lattice dilation suffer in the structure for the nitrogen on interstitials position generated compression residual stress [1,2,3] to increase the lattice parameter from 4.57 A to 4.60 A. Size grain and microstress were measured whit Willian-Hall Metod, XRD patterns and the FWHM of each peaks. The flow increased produce that the size grain increases too; it is produced for the increase the atoms mobility time on the surface, may is relating with a less mobility the atoms in the surface [4]. The DFT analysis, shown a direct reactivity between zirconium and nitrogen, shown the high stability that presents the δ-phase.