The chromium is a material broadly used in the protection of industrial pieces, especially in those that are subjected to highly corrosive environment and big mechanical efforts. These applications are due to their physical, chemical and mechanical properties, among those that low electrical conductivity, chemical stability and low friction coefficient. Presently work is given to know the results obtained in the growth of thin films of chromium by means of magnetron sputtering RF. The films have been grown in substrates of stainless steel starting from a chromium target (99.99%). Basically, the study has been centered in finding the best deposit condition for the power applied to the target and the threshold time to achieve chromium polycrystalline films. The obtained films were characterized structurally, by X-ray diffraction (XRD); morphologically by scanning electron microscopy (SEM) and chemically by X-ray photoelectron spectroscopy (XPS).