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Statistical study of the variable speed of an AACVD device implemented in the UTP

Acceso Abierto
ID Minciencias: ART-0000031542-161
Ranking: ART-GC_ART

Abstract:

Abstract The spray assisted chemical vapor deposition (AACVD) technique is used to make thin film growth through the spraying of a precursor solution in the form of droplets, by means of a nozzle moving horizontally along the substrate. One of the most influential variables in the growth of the films is the speed with which the nozzle moves, since the deposition uniformity depends on this, which is directly related to the different physical properties of the coating. This paper briefly shows the electronic control built for the manipulation of this variable and a statistical study is presented that allowed to determine that the experimental speed presents oscillations less than 10% with respect to the programmed value. In addition, comparative transmittance spectra are shown where the reproducibility and repeatability of the coatings manufactured with the AACVD equipment built in the UTP is observed.

Tópico:

Surface Roughness and Optical Measurements

Citaciones:

Citations: 4
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Información de la Fuente:

SCImago Journal & Country Rank
FuenteJournal of Physics Conference Series
Cuartil año de publicaciónNo disponible
Volumen1221
Issue1
Páginas012077 - 012077
pISSNNo disponible
ISSN1742-6596

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