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Graphite Thin Films Production by Laser Ablation.

Acceso Abierto
ID Minciencias: ART-0000036048-208
Ranking: ART-ART_B

Abstract:

Graphite thin films on silicon substrate were synthesized by the fundamental and second harmonics of a Nd : YAG pulsed laser, varying the substrate temperature from 200°C to 500°C . The oxygen gas pressure was of 2x10-5 Torr for all thin films grown. The samples were characterized by Raman and UV-Vis spectroscopy. With Raman spectroscopy the vibrational modes D, G and 2D, were identified. A strong dependence of the Absorbance of samples with substrate temperature was observed. The nanostructure of sample grown at 500°C corresponding to graphene oxide. The average thick of thin films was of 65 nm and 40 nm for fundamental and second harmonics respectively.

Tópico:

Graphene research and applications

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Citations: 1
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Información de la Fuente:

FuenteScientia et technica
Cuartil año de publicaciónNo disponible
Volumen23
Issue4
Páginas594 - 598
pISSNNo disponible
ISSN0122-1701

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