Journal Article Analysis of H 2 and SiH 4 in the Deposition of pm-Si:H Thin Films by PECVD Process for Solar Cell Applications Get access J Plaza-Castillo, J Plaza-Castillo Department of Physics, Universidad del Atlántico, Barranquilla, Colombia Search for other works by this author on: Oxford Academic Google Scholar A García-Barrientos, A García-Barrientos Faculty of Science, Universidad Autónoma de San Luis Potosí, San Luis Potosí, México Search for other works by this author on: Oxford Academic Google Scholar M Moreno-Moreno, M Moreno-Moreno Department of Electronics, INAOE, Puebla, Mexico Search for other works by this author on: Oxford Academic Google Scholar M J Arellano-Jiménez, M J Arellano-Jiménez Department of Physics and Astronomy, University of Texas at San Antonio, USA Search for other works by this author on: Oxford Academic Google Scholar K Y Vizcaíno, K Y Vizcaíno Department of Physics, Universidad del Atlántico, Barranquilla, Colombia Search for other works by this author on: Oxford Academic Google Scholar JL Bernal JL Bernal Mechanics Department, Universidad Politécnica de Pachuca, Hidalgo, México Search for other works by this author on: Oxford Academic Google Scholar Microscopy and Microanalysis, Volume 22, Issue S3, 1 July 2016, Pages 1874–1875, https://doi.org/10.1017/S1431927616010217 Published: 25 July 2016