Logotipo ImpactU
Autor

Effect of Planarization on the Contact Behavior of Patterned Media

Acceso Cerrado
ID Minciencias: ART-0000151203-13
Ranking: ART-ART_A2

Abstract:

The contact behavior of patterned media was examined using a 2-D plane strain finite-element model. The maximum stresses always occurred on the lower right corner of the pattern at the edge of the contact. The effects of planarization on the resulting contact stresses for different filling materials were compared. Using a filling material resulted in a decrease of the contact stresses in the patterns since it not only made the media more robust, but it also helped in relieving the contact load on the top of the patterns. In comparing harder and softer filling materials, it was found that harder materials offer a slight advantage in alleviating the stresses.

Tópico:

Adhesion, Friction, and Surface Interactions

Citaciones:

Citations: 7
7

Citaciones por año:

Altmétricas:

Paperbuzz Score: 0
0

Información de la Fuente:

SCImago Journal & Country Rank
FuenteIEEE Transactions on Magnetics
Cuartil año de publicaciónNo disponible
Volumen44
Issue11
Páginas3667 - 3670
pISSNNo disponible
ISSN1941-0069

Enlaces e Identificadores:

Minciencias IDART-0000151203-13Scienti ID0000151203-13Openalex URLhttps://openalex.org/W2131837311
Doi URLhttps://doi.org/10.1109/tmag.2008.2002593
Artículo de revista