The optical characteristics of Diffractive Optical Elements are determined by the properties of the photosensitive film on which they are produced. When working with photoresist plates, the most important property is the change in the plate's topography for different exposures. In this case, the required characterization involves a topographic measurement that can be made using digital holography. This work presents a digital holography system in which a hologram's phase map is obtained from a single recorded image. The phase map is calculated by applying a phase-shifting algorithm to a set of images that are created using a digital phase-shifting/tilteliminating procedure. Also, the curvatures, introduced by the imaging elements used in the experimental setup, are digitally compensated for using a polynomial fitting-method. The object's topography is then obtained from this modified phase map. To demonstrate the proposed procedure, the topography of patches exposed on a Shipley 1818 photoresist plate by microlithography equipment-which is currently under construction-is shown.