Due to its extensive field of application in different areas, including mechanics, electronics, tribology and optics the last decade has seen a large interest the study of titanium–zirconium–nitride (Ti–Zr)N thin films grown by different techniques. We had produced (Ti–Zr)N thin films and in this work chemical, morphological and electronics analysis are presented. Thin films were produced by the PAPVD (plasma assisted physics vapor deposition) technique, by pulsed arc in a mono-vaporizer system using a titanium–zirconium target with 99.99% purity. Argon–nitrogen mixture for the discharge was used. For the analyses X-ray photoelectron spectroscopy (XPS) and scanning probe microscopy (SPM) techniques were used, XPS results shown the chemical composition of the films. Films were morphologically and tribologically characterized using SPM, obtaining grain size and friction coefficient.