Carbon‐based coatings were produced by arc plasma for physical vapor deposition starting from HOPG (High Oriented Pyrolitic Graphite) target. The coatings were deposited on substrates of silicon (100) and (110) a temperature of 46°C. XRD spectra and AFM images were taken on samples, further the plasma was characterized by OES. The low temperature of deposition process allows its employ in a wide range of applications.
