Nanostructured Ti films were obtained employing a cathodic arc with a straight magnetic filter. The films were characterized using X-ray diffraction, scanning electron and atomic force microscopy. The films were found to be dense and with columnar grains, whose size increased with the exposure time. The number of macroparticles, the film roughness and the deposition rate were also analyzed, and the latter compared with the results of a fluid plasma model. Number of macroparticles and film roughness in samples located ahead of the magnetic duct inlet were higher than those determined from samples placed inside the magnetic duct. The deposition rate depended on the axial and radial position inside the duct. The thickness along the radial position was more uniform for samples located at axial positions near the filter extremes, but the mean deposition rate was lower at these positions. Measured and modeled deposition rates agreed reasonably well.