During the last decade the dc and rf sputtering techniques have been used extensively in their two configurations — balanced and unbalanced magnetron. The main applications have been in the fields of industry and research. Examples of industrial applications are: decorative thin films (Raymond & Baham, 1999), hard wear-resistant thin films (Rodil & Olaya, 2006), low-friction thin films (Heimberg et al., 2001) corrosion-resistant thin films (Flores et al., 2006), and thin films used as a protective optical system (Stefan et al., 2008), as well as maybe the most interesting applications, thin films used in the electronic industry (Monroy et al., 2011). In the research field, the investigation has been oriented toward understanding the main physical mechanisms, such as: interaction between charged particles and the surface of the target material, adherence between the substrate and the deposited material, and chemical reactions near the substrate, as well as the influence of the deposit parameters (substrate temperature, working pressure, density power applied to the target). This research has produced thin films with a high degree of crystallinity and with the possibility of various industrial applications.